October 20-23, 2026

EuroNanoLab Experts School

Keynote Speakers

  • Chris A. Mack

    Chief Technical Officer
    Fractilia

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  • Elena Pinilla-Cienfuegos

    Associate Professor at the Universitat Politècnica de València (UPV)

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  • Jordi Llobet

    Researcher at the Institute of Microelectronics of Barcelona (IMB-CNM-CSIC)

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  • Karen Birkelund

    Head of lithography and wet chemistry atTechnical University of Denmark (DTU) | DTU Nanolab | National Centre for Nano Fabrication and Characterization

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  • Helmut Schift

    Head of the Polymer Nanotechnology Group in the Laboratory for Micro- and Nanotechnology at the Paul Scherrer Institut

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  • Yoshio Mita

    Full professor of the Department of  Electrical Engineering and Information Systems (EEIS)

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Invited Speakers

  • Christian Maibohm

    Research Scientist at the International Iberian Nanotechnology Laboratory

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  • Bhavishya Chowrira

    Senior R&D Engineer at imec

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  • Diogo Aguiam

    Staff Researcher at the International Iberian Nanotechnology Laboratory

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  • Douglas Guerrero

    Technology strategy and management, Brewer Science, Inc

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  • Eliott Clerc

    R&D Engineer in the Process and Applications Laboratory at Heidelberg Instruments Nano

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  • Gianluca Grenci

    University of Padua

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  • Jan Beltman

    Manager Applications Mature Products at ASML

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  • Jens Hemmingsen

    Technical University of Denmark (DTU)

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  • Jochen Zimmer

    3D microfabrication expert and Sales Manager at Nanoscribe

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  • Luis Miguel Custodio

    WLP Metrology Eng Coordinator at Amkor Technology

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  • Markus Postl

    JOANNEUM RESEARCH

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  • Rita Macedo

    INESC-MN

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  • Sara Sequeira

    Eindhoven University of Technology

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  • Saulo Moura

    Applications Engineer Mature Products at ASML

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  • Søren Isaksen

    CEO of Copenhagen Microsystems

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  • Stefano L. Oscurato

    Professor & Lead of Holo-Lithography Research Group at the Department of Physics “Ettore Pancini”, University of Naples Federico II

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  • Vincenzo Miceli

    Senior Staff Engineer
    Lithography Yield Improvement Lead & Advanced Overlay Specialist, Intel Corporation

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  • Yu Kyoung Ryu

    Instituto de Sistemas Optoelectrónicos y Microtecnología (Universidad Politécnica de Madrid)

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  • Yann Chevolot

    CNRS, École Centrale de Lyon

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Who should attend?

This event welcomes the entire European nanotechnology community and beyond:

  • Academic researchers seeking to expand their expertise or discover new techniques

  • Industry professionals driving innovation in nanofabrication

  • Cleanroom managers and technical experts wanting to strengthen their competencies

  • Anyone passionate about the future of micro- and nanotechnology

  • PhD students and early-career researchers exploring lithography technologies

Why Attend?

  • Learn from leading experts in lithography across Europe's premier nanofabrication centres

  • Explore emerging technologies, including nanoimprint lithography, interference lithography, and sustainable materials

  • Build your professional network with researchers and industry partners across the European nanotechnology ecosystem

  • Access world-class facilities through exclusive cleanroom tours

  • Be part of a growing movement toward green and sustainable nanofabrication practices

  • Gain hands-on experience with cutting-edge techniques and equipment

Register now to secure your place in this inaugural event.

Spaces are limited, particularly for hands-on training sessions and cleanroom tours. All participants are eligible to receive a certificate of participation. Please indicate your preference during registration.

Deadline: October 16

Programme

TUESDAY - OCTOBER 20
TimeTalkPresenter
08:30Registration with coffee/tea
09:00School opening ceremonyIvan Prieto — INL
09:15EuroNanoLab organisationLaurent Mazenq — LAAS-CNRS
09:30KEYNOTE :: Beauties and Challenges in Rapid and Large-Area Direct Electron Beam LithographyYoshio Mita — The University of Tokyo
10:15Coffee break
10:45Optical Lithography: from High Volume Silicon Manufacturing to Novel TechnologiesJan Beltman / Saulo Moura — ASML
11:30Beyond the Golden Tool: Leading-Edge EUV Patterning Challenges in High-Volume ManufacturingVincenzo Miceli — Intel Corporation
12:30Lunch buffet
13:30KEYNOTE :: Focused ion beam implantation as a high resolution lithography tool for advanced nanoelectronic devicesJordi Llobet — IMB-CNM-CSIC
14:15Practical Laser Interference LithographyDiogo Aguiam — INL
15:00Coffee break
15:30Thermal Scanning Probe Lithography: Fundamentals and Focus on 2D Materials in Advanced ApplicationsYu Kyoung Ryu — Universidad Politécnica de Madrid (UPM)
15:55Grayscale patterning for novel applicationsEliott Clerc — Heidelberg Instruments
16:20From Design to Roll-to-Roll Replication: Scalable Manufacturing of Micro- and Nanostructured Optical ComponentsMarkus Postl — JOANNEUM RESEARCH – MATERIALS
16:45Lighting Jewells: HCS-SPIM platform for parallel growth and live imaging of hundreds of Organoids in protected micro-environmentsGianluca Grenci — University of Padua
17:10Coffee/tea — cleanroom tours gathering
17:20Cleanroom tours — MNF Staff
WEDNESDAY - OCTOBER 21
TimeTalkPresenter
08:30Start-up with coffee/tea
09:00KEYNOTE :: Nanoimprint lithography is in industry and here to stay – why, where and how?Helmut Schift — Paul Scherrer Institute (PSI)
09:453D EBL with organic ice resistsSøren Isaksen — Copenhagen Microsystems
10:30Coffee break
11:00The Evolution of Two-Photon Polymerization: Capabilities, Limitations, and State of the ArtJochen Zimmer — Nanoscribe GmbH & Co. KG
11:45Risk-Based Assessment of Expired Chemicals at DTU NanolabJens Hemmingsen — DTU Nanolab
12:15Aligned 3D Microprinting for Multi-step and Multi-material FabricationJochen Zimmer — Nanoscribe
12:25PhotonExport and Notion Systems: Partners in LithographyErnesto Barrera / Uwe Mueller — PhotonExport
12:35Lunch buffet
13:30KEYNOTE :: Soft Lithography for Nanoparticle Patterning: From Fundamentals to Nanophotonic ApplicationsElena Pinilla-Cienfuegos — Universitat Politècnica de València (UPV) / Centro de Tecnología Nanofotónica de Valencia (NTC)
14:15Chitosan, a biosourced polysaccharide as an ecofriendly resist for lithography?Yann Chevolot — CNRS
15:00Coffee break
15:30Mapping bonded wafer distortions to enable post-bonding overlay in DUV lithographySara Sequeira — Eindhoven University of Technology
15:50Printing the Future: The Journey from EUV to High-NA EUV LithographyBhavishya Chowrira — imec
16:20How to optimise your EBL process with VECTORVincent Morin — Raith
16:30Write, Mill, Repeat: Automating Nanopatterning with AutoScriptJérôme Laval — Thermofisher
16:40Software Solutions to advance metrology and inspectionDimitri Titko — GenISys
16:50SMA Litho Tools PortfolioSegundo Muñoz Amorín — SMA
17:00Coffee break
17:10Cleanroom tours — MNF Staff
18:00Free time
19:00 - 22:00School dinner
THURSDAY - OCTOBER 22
TimeTalkPresenter
09:30Start-up with coffee/tea
09:50KEYNOTE :: How to enhance the resolution of an old DUV stepper tool and a comparative study of maskless and mask alignersKaren Birkelund — DTU Nanolab
10:35Coffee break
11:00Vectorial photopatterning of azopolymers for reprogrammable diffractive opticsStefano Luigi Oscurato — University of Naples Federico II
11:45Advances and application of two-photon polymerisationChristian Maibohm — INL
12:15Next Level Laser LithographyDaniel Braun — Heidelberg Instruments
12:25Process Discovery and intelligent fab managementJan Tiepelt — Fabublox
12:35Lunch buffet
13:30KEYNOTE :: Stochastics: the Ultimate Limiter of Lithography ResolutionChris Mack — Fractilia
14:15Boosting Lithography optimization with AI for thin film device fabricationRita Macedo — INESC-MN
15:002D Materials in advanced semiconductorsDouglas Guerrero — Brewer Science
15:45Academic Overview of Microchip Technology and the Semiconductor IndustryLuis Custódio — ATEP – Amkor Technology Portugal
16:30School closing ceremony
16:45Coffee break
17:00Cleanroom tours — MNF Staff
FRIDAY - OCTOBER 23
TimeTalkPresenter
08:30Coffee/tea
09:00Students hands-on trainingMNF staff
12:00Lunch buffet
13:00FarewellMNF staff

Poster Presentation

Participants are invited to present a poster during the school. All poster presenters will receive a certificate of presentation.

Submission Guidelines

  • Abstracts must be written in English and must not exceed 2,500 characters including spaces

  • Format: A0 (841 × 1189 mm), portrait orientation

  • Posters may be displayed in the designated poster area following check-in

Deadline & Selection

Submit your abstract by September 30, 2026. All submissions will be reviewed by the Organising Committee, and applicants will be notified of the decision via the email address provided at submission.

Building European Excellence in Nanofabrication

The inaugural Lithography Experts School marks a major milestone for the EuroNanoLab consortium, establishing a premier platform to advance lithography expertise across Europe. This foundational event strengthens the four core pillars that define our mission:

Enhance excellence by building superior processing competence in advanced lithography techniques.

Share competencies by defining European standards in cleanroom procedures and lithography best practices.

Accelerate research by enabling process exchange and providing a single access point to micro- and nanofabrication research infrastructure and expertise.

Strengthen cooperation by building an alliance between scientists and micro- and nanofabrication experts.

Expert-Led Education and Knowledge Exchange

Internationally recognised academic and industrial lithography specialists will deliver lectures covering the full spectrum of modern lithography: from fundamental principles and resist chemistry to advanced patterning techniques, process simulation, and cutting-edge applications across multiple technology nodes.

The school creates a dedicated space for lithography experts to connect, exchange ideas, discuss recent breakthroughs and technical challenges, and explore emerging advances in lithography equipment and processing technologies. By bringing together the European nanofabrication community, the 1st Lithography Experts School establishes a foundation for sustained collaboration and accelerated innovation in one of the most critical technologies for next-generation device fabrication.

The EuroNanoLab Expert School Lithography is the flagship educational initiative from our network, bringing together researchers, PhD students, early-career scientists, and industry professionals to explore the present and future of lithography technologies. This inaugural school represents our commitment to fostering excellence in nanofabrication through hands-on training and knowledge exchange.

Over four intensive days in Braga, Portugal, participants will engage with:

Foundational & Advanced Techniques: Optical, laser, and electron-beam lithography

Hands-On Training: Limited-capacity sessions designed for non-expert participants to build practical skills.

Cutting-edge Approaches: Nanoimprint lithography (NIL), interference lithography, greyscale, and emerging alternative techniques.

Cleanroom Tours: Expert-led facility tours showcasing world-class nanofabrication infrastructure.

Sustainability Focus: Green materials and sustainable practices in lithography.

Networking & Collaboration: Direct engagements with leading lithography experts and peers across Europe's nanotechnology ecosystem.

Our sponsors

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What is EuroNanoLab?

EuroNanoLab is a distributed research infrastructure uniting more than 40 state-of-the-art academic nanofabrication centres across Europe. Our mission is to accelerate research in micro- and nanotechnology by transforming a fragmented landscape of national facilities into an integrated, collaborative knowledge base that drives scientific excellence and innovation.

As a collective of leading European cleanrooms, EuroNanoLab offers a single point of access to cutting-edge expertise, world-class equipment, and shared knowledge — enabling researchers, students, and industry partners to achieve breakthroughs faster and more efficiently.

EuroNanoLab strives to provide:

  • New nanofabrication systems capable of fabricating more complex micro- and nanodevices, by integrating the specialised contributions of multiple cleanrooms to accelerate high-impact scientific projects.

  • Coordinated user access to world-class nanofabrication equipment, expertise, technology development, and a shared knowledge base through a central hub.

  • Multidisciplinary outreach and novel nanofabrication building blocks, co-defined with leading experts across key scientific communities: quantum technologies, 2D materials, nanobiosciences, neuromorphic computing, and astronomy and space exploration.

  • Fast technology transfer to start-ups and SMEs.

EuroNanoLab contributes to innovative solutions for societal challenges in energy, environment, transport, health, and general well-being. Achieving ESFRI landmark status will further strengthen EuroNanoLab's recognition at both national and international levels.

EuroNanoLab's model draws inspiration from the NNIN — the US distributed infrastructure of academic cleanrooms established in 2004. EuroNanoLab’s core partners include cleanroom networks that have been working with this model for over 15 years (Sweden, the Netherlands, France, and Norway).

Scientific and Organisational Committees

  • José Rodrigues

    Micro and Nanofabrication Facility Lead

    International Iberian Nanotechnology Laboratory

  • Joana Santos

    Micro and Nanofabrication Facility Engineer: Lithography Specialist

    International Iberian Nanotechnology Laboratory

  • Ivan Prieto

    Head of Micro and Nanofabrication Facility

    International Iberian Nanotechnology Laboratory

  • Laurent Mazenq

    Engineer / Coordination support for the EuroNanoLab Litho Expert Group

    LAAS-CNRS (FR)

  • Alessandro Cian

    Researcher / Coordination support for the EuroNanoLab Litho Expert Group

    Fondazione Bruno Kessler (IT)

  • Mario Malerba

    Researcher / Coordination support for the EuroNanoLab Litho Expert Group

    National Metrology Institute of Italy (IT)

  • Nathalie Bardou

    Engineer / Coordination support for the EuroNanoLab Litho Expert Group

    C2N-CNRS (FR)

Accommodation

Braga offers a range of accommodation options to suit different budgets and preferences.

We have compiled a selection of recommended hotels and guesthouses conveniently located near the venue. For the full list and booking details, please visit our accommodation page.

Venue

The INL International Iberian Nanotechnology Laboratory, located in Braga (North of Portugal), was founded by the governments of Portugal and Spain under an international legal framework to perform interdisciplinary research and deploy and articulate nanotechnology for the benefit of society.

INL aims to become the worldwide hub for nanotechnology, addressing society’s grand challenges.

INL – International Iberian Nanotechnology Laboratory

Av. Mestre José Veiga
4715-330 Braga | Portugal

+ www.inl.int

Let’s talk!

For any queries, please contact the Conference Team. Fill in the form, and we will be in touch soon!

INL – International Iberian Nanotechnology Laboratory

Av. Mestre José Veiga
4715-330 Braga | Portugal

+ www.inl.int