Title:
Thermal Scanning Probe Lithography: Fundamentals and Focus on 2D Materials in Advanced Applications
Abstract:
Thermal scanning probe lithography (t-SPL) is a direct writing technique that allows defining patterns with high resolution and free geometry in a wide range of materials, under ambient conditions. Its closed-loop lithography system makes it possible to perform in-situ imaging and correction of writing parameters during the fabrication process. It enables grayscale lithography with nanometric resolution in the vertical direction. It has demonstrated an overlay accuracy of a few nanometers and a field stitching accuracy of 25 nm. In this talk, first, the main features of the technique will be described: devoted cantilever, principal resist, associated lithographic processes and potential applications. Then, we will follow the journey of contacting mechanically exfoliated MoS2 flakes with metallic contacts using the commercial tool called NanoFrazor, step by step. Finally, we will go through a review of some of the recent proof-of-concept applications and nanodevices based on 2D materials using the t-SPL technology.
Dr. Yu Kyoung Ryu
Yu Kyoung Ryu is an Assistant Professor at Universidad Politécnica de Madrid (UPM), in the department of Física Aplicada e Ingeniería de Materiales (ETSII). She currently develops her scientific investigation at the Instituto de Sistemas Optoelectrónicos y Microtecnología (ISOM), focusing on the research lines of 2D materials for energy storage, laser-induced graphene applications and thermal scanning probe lithography for the development of advanced nanodevices.
She received the Physics degree from Universidad Complutense de Madrid (2009). She achieved the PhD (2015) at Instituto de Ciencia de Materiales de Madrid (ICMM), Consejo Superior de Investigaciones Científicas (CSIC), on the topic of patterning and fabrication of nanodevices based on Si and 2D materials by oxidation scanning probe lithography. She studied the high resolution achievable in thermal scanning probe lithography during a postdoctoral stay at IBM Laboratory Zurich (2016-2017) and the tuning of the excitonic response in few-layer MoS2 by strain engineering in another postdoctoral stay at ICMM (2019). She has published 31 peer-reviewed articles, 3 book chapters and a scientific book.