Title:
Chitosan, a biosourced polysaccharide as an ecofriendly resist for lithography?

Abstract:
Resists are essential materials for lithography, which is a key step in the fields of micro-nanoelectronics, nano-microtechnology, and photonics.They allow substrate patterning, leading to the fabrication of functional devices. Conventional resists are currently based on synthetic compounds processed using potentially hazardous chemicals. Recently, concerns have been raised regarding the sustainability, the environmental impact, the safety related cost and the mitigation of future regulatory restrictions. Furthermore, the forecasted scarcity of oil calls for the anticipation of alternative materials.
In this context, chitosan is a promising biosourced material derived from biomass, in particular from food-industry waste. It is biocompatible, biodegradable, non-toxic and water-soluble. It also exhibits a good adhesion on silica and can make thin films.
In this context, various chitosan formulations were evaluated as photoresists using additives that enable either positive- or negative-tone behavior. The influence of the polysaccharide structures and of the additives on lithographic sensitivity and behavior was studied. Possible photochemistry mechanisms are also proposed. Advantages and limitations are discussed.
This work was supported by the EU project “Resist materials for transition to green processing in semiconductor industry” (RESIN GREEN), funded from the European Union’s Horizon Europe research and innovation program under Grant Agreement No. 101135783, supported by the Chips Joint Undertaking.

Authors: Dipti Rania,d, Kylian Virieuxb, Stephane Trombottob, Charalampos Katsogridakisc, Angeliki Sofia Foscolosc,  Anastasia Soultatic, Veroniki P. Vidalic, Corinne Gablind, Didier Leonardd, Magin Benedict Ferrere,f , Olivier Sopperae,f, Ivanie Mendèsg, Jeanne Aigoing, Isabelle Serving, Jean-David Isasah, Dimitrios Kazazish, Yasin Ekincih, Panagiotis Argitisc, Jean-Louis Leclercqa , Yann Chevolota

Affiliations
a) CNRS, Ecole Centrale de Lyon, INSA Lyon, Université Claude Bernard Lyon 1, CPE Lyon, INL, UMR5270, Ecully, 69134, France.
b) Université Lyon 1, INSA Lyon, Université Jean Monnet, CNRS, IMP, UMR 5223, Villeurbanne, France
c) National Centre for Scientific Research “Demokritos” (NCSR “Demokritos”), Institute of Nanoscience and Nanotechnology, Agia Paraskevi, Athens, 15341, Greece.
d) Université Lyon1, CNRS, ISA UMR5280, Lyon, 69100, France.
e) Université de Haute Alsace, CNRS, IS2M UMR 7361, Mulhouse, 68100, France
f) Université de Strasbourg, 4 rue Blaise Pascal, CS 90032, Strasbourg, 67081, France
g) Univ. Grenoble Alpes, CEA, LETI, Grenoble F-38000, France
h) Paul Scherrer Institute-Laboratory of X-Rays Nanosciences and Technologies, Forschungsstrasse 111, 5232 Villigen-PSI, Switzerland