Title:
Optical Lithography: from High Volume Silicon Manufacturing to Novel Technologies
Abstract:
In this talk, we will discuss developments in Optical Lithography that have driven high-volume silicon manufacturing over the past decades. The future will require not only further increases in transistor density (2D scaling) but also the integration of different functionalities into one chip (3D integration). Novel techniques will play an important role in that. We will discuss how production-worthy optical lithography tools can play an important role at universities and institutes investigating these novel technologies, as well as in smoothly bringing those technologies towards industrial manufacturing.
Saulo Moura
Saulo Moura is an applications engineer at ASML, having previously worked in the biomedical devices and pharmaceutical industries. He holds a BSc in Mechanical Engineering (PUC Minas, Brazil) and an MSc in Nanoscale Engineering (École Centrale de Lyon, France). His professional focus includes lithography requirements in photonics, MEMS, logic, MicroLEDs, among others.