Title:
Stochastics: the ultimate limiter of lithography resolution
Abstract:
Since the birth of the integrated circuit, electronics industry growth and innovation have relied on semiconductor manufacturers putting ever smaller features into production. Yet today, stochastics, the randomness inherent to chip making near the atomic scale, is threatening the continued ability to manufacture the smallest possible features in volume production. To understand the impact of stochastics on semiconductor manufacturing today, the Stochastics Resolution Gap is defined and used as a framework for assessing the value of reducing stochastics variability. This talk introduces stochastics, their emerging limitations on lithography resolution, technology solutions for improving resolution and yield, and the importance of accurate measurement technology for bridging the stochastics resolution gap.
Dr. Chris Mack
Dr. Chris A. Mack developed the lithography simulation software PROLITH and founded and ran FINLE Technologies for ten years. He then served as Vice President of Lithography Technology for KLA-Tencor for five years, until 2005. In 2003 he received the SEMI Award for North America for his efforts in lithography simulation and education and in 2009 he received the SPIE Frits Zernike Award for Microlithography. He is a fellow of SPIE, Optica, and IEEE and was also an adjunct faculty member at the University of Texas at Austin for 25 years. From 2012 to 2019, he served as Editor-in-Chief of the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3). In 2017 he cofounded Fractilia, where he now works as Chief Technical Officer.