Title:
Optical Lithography: from High Volume Silicon Manufacturing to Novel Technologies
Abstract:
In this talk, we will discuss developments in Optical Lithography that have driven high-volume silicon manufacturing over the past decades. The future will require not only further increases in transistor density (2D scaling) but also the integration of different functionalities into one chip (3D integration). Novel techniques will play an important role in that. We will discuss how production-worthy optical lithography tools can play an important role at universities and institutes investigating these novel technologies, as well as in smoothly bringing those technologies towards industrial manufacturing.
Jan Beltman
Jan Beltman has an MSc in Physics at the University of Twente, Netherlands. He joined ASML in 1989, where he was involved in the design of the first 8” ASML steppers and scanners. After that, he moved to Applications, supporting ASML customers by introducing ASML tools into manufacturing Fabs and optimising their use. Current focus is on enabling novel technologies using mature ASML litho systems.